Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
July 8, 2008
0Patent Application Number
103132830
Date Filed
December 6, 2002
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A method of making a semiconductor structure, comprises cleaning a gate stack with a cleaning solution. The gate stack comprises a gate layer, a metallic layer on the gate layer, and a etch-stop layer on the metallic layer. The gate layer is on a semiconductor substrate, the cleaning solution is a non-oxidizing cleaning solution, and the metallic layer comprises an easily oxidized metal.
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