Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
August 19, 2008
Patent Application Number
11543187
Date Filed
October 4, 2006
Patent Primary Examiner
Patent abstract
A wafer structure with mirror shot is provided. A wafer structure according to the present invention comprises a first mirror shot area to which a mirror shot is applied, wherein the position of a first die is searched for based on the first mirror shot area. The wafer structure further comprises a second mirror shot area to which the mirror shot is applied. The second mirror shot area is located diagonally with respect to the first mirror shot area.
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