Patent 7414324 was granted and assigned to SAMSUNG ELECTRONICS CO., LTD. on August, 2008 by the United States Patent and Trademark Office.
A wafer structure with mirror shot is provided. A wafer structure according to the present invention comprises a first mirror shot area to which a mirror shot is applied, wherein the position of a first die is searched for based on the first mirror shot area. The wafer structure further comprises a second mirror shot area to which the mirror shot is applied. The second mirror shot area is located diagonally with respect to the first mirror shot area.