Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Takehiko Orii0
Masaru Amai0
Date of Patent
August 26, 2008
0Patent Application Number
104884060
Date Filed
August 28, 2002
0Patent Primary Examiner
Patent abstract
A substrate processing apparatus and a substrate processing method are provided wherein an oxide film which is thinner than the conventional films can be formed with uniform thickness when forming an oxide film on the front-side surface of a substrate.
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