US Patent 7416632 Substrate processing apparatus and substrate processing method
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Patent Inventor Names
Masaru Amai0
Takehiko Orii0
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Patent abstract
A substrate processing apparatus and a substrate processing method are provided wherein an oxide film which is thinner than the conventional films can be formed with uniform thickness when forming an oxide film on the front-side surface of a substrate.
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US Patent 07416632 Substrate processing apparatus and substrate processing method US Patent 7416632 Substrate processing apparatus and substrate processing method
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Patent Number
074166320
Patent Number
74166320
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Patent Jurisdiction
Patent Number
074166320
Date of Patent
August 26, 2008
0Patent Application Number
104884060
Date Filed
August 28, 2002
0Official Website
Patent Primary Examiner
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US Patent 07416632 Substrate processing apparatus and substrate processing method
Infobox
Is a
Patent jurisdiction
Patent number
07416632
Date of patent
August 26, 2008
Patent application number
10488406
Date Filed
August 28, 2002
Patent primary examiner
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