Patent 7428173 was granted and assigned to Micron Technology on September, 2008 by the United States Patent and Trademark Office.
A buried bipolar junction is provided in a charge trapping transistor memory device. During a write operation electrons are injected into a surface depletion region of the memory cell transistors. These electrons are accelerated in a vertical electric field and injected over a barrier to a charge trapping dielectric layer of the memory cells.