Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 9, 2008
Patent Application Number
11671570
Date Filed
February 6, 2007
Patent Primary Examiner
Patent abstract
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from the chemical cleaner to form insoluble precipitates, and rinsing the photomask with a fluid to remove the insoluble precipitates from the photomask.
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