US Patent 7462248 Method and system for cleaning a photomask
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Patent abstract
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from the chemical cleaner to form insoluble precipitates, and rinsing the photomask with a fluid to remove the insoluble precipitates from the photomask.
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US Patent 07462248 Method and system for cleaning a photomask US Patent 7462248 Method and system for cleaning a photomask
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Patent Number
0746224800
Patent Number
746224800
Edits on 21 May, 2023
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Infobox
Is a
Patent Jurisdiction
Patent Number
074622480
Date of Patent
December 9, 2008
0Patent Application Number
116715700
Date Filed
February 6, 2007
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
074622480
Date of Patent
December 9, 2008
0Patent Application Number
116715700
Date Filed
February 6, 2007
0Official Website
Patent Primary Examiner
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US Patent 07462248 Method and system for cleaning a photomask
Infobox
Is a
Patent jurisdiction
Patent number
07462248
Date of patent
December 9, 2008
Patent application number
11671570
Date Filed
February 6, 2007
Patent primary examiner
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