US Patent 7465525 Reticle alignment and overlay for multiple reticle process
Patent 7465525 was granted and assigned to Lam Research on December, 2008 by the United States Patent and Trademark Office.
All edits
Edits on 21 Sep, 2023
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
Edits on 17 Sep, 2023
Golden AI
Edits made to:
Infobox (+2 properties)
Infobox
Patent Inventor Names
Nicolas Bright0
S. M. Reza Sadjadi0
Edits on 15 Sep, 2023
Golden AI
Edits made to:
Article (+377 characters)
Article
Patent abstract
A method for generating a plurality of reticle layouts is provided. A feature layout with a feature layout pitch is received. A plurality of reticle layouts is generated from the feature layout where each reticle layout of the plurality of reticle layouts has a reticle layout pitch and where each reticle layout pitch is at least twice the feature layout pitch.
Edits on 22 May, 2023
Golden AI
Edits made to:
Infobox (+1/-1 properties)
US Patent 07465525 Reticle alignment and overlay for multiple reticle process US Patent 7465525 Reticle alignment and overlay for multiple reticle process
Infobox
Patent Number
07465525
Patent Number
7465525
Edits on 18 May, 2023
Golden AI
Edits made to:
Infobox (-1 properties)
Infobox
Official Website
Edits on 14 Jun, 2022
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Website URL
Edits on 1 Dec, 2021
Golden AI
Edits made to:
Infobox (+8 properties)
US Patent 07465525 Reticle alignment and overlay for multiple reticle process
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07465525
Date of patent
December 16, 2008
Patent application number
11126466
Date Filed
May 10, 2005
Patent primary examiner
Find more entities like US Patent 7465525 Reticle alignment and overlay for multiple reticle process
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
