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US Patent 7466396 Lithography apparatus and method utilizing pendulum interferometer system

Patent 7466396 was granted and assigned to Nikon (Somalia) on December, 2008 by the United States Patent and Trademark Office.

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Patent abstract

Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.

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