US Patent 7466396 Lithography apparatus and method utilizing pendulum interferometer system
Patent 7466396 was granted and assigned to Nikon (Somalia) on December, 2008 by the United States Patent and Trademark Office.
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Patent Inventor Names
Douglas C. Watson0
Hideaki Sakamoto0
Hiroto Horikawa0
Michael B. Binnard0
W. Thomas Novak0
Yoshifumi Nakakoji0
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Patent abstract
Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.
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US Patent 07466396 Lithography apparatus and method utilizing pendulum interferometer system US Patent 7466396 Lithography apparatus and method utilizing pendulum interferometer system
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Patent Number
074663960
Patent Number
74663960
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Current Assignee
Patent Jurisdiction
Patent Number
074663960
Date of Patent
December 16, 2008
0Patent Application Number
115463680
Date Filed
October 12, 2006
0Official Website
Patent Primary Examiner
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US Patent 07466396 Lithography apparatus and method utilizing pendulum interferometer system
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07466396
Date of patent
December 16, 2008
Patent application number
11546368
Date Filed
October 12, 2006
Patent primary examiner
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