US Patent 7468110 Hollow cathode target and methods of making same
Patent 7468110 was granted and assigned to Cabot Corporation on December, 2008 by the United States Patent and Trademark Office.
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Patent Inventor Names
Christopher A. Michaluk0
Robert B. Ford0
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Patent abstract
Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.
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US Patent 07468110 Hollow cathode target and methods of making same US Patent 7468110 Hollow cathode target and methods of making same
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Patent Number
074681100
Patent Number
74681100
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Current Assignee
Patent Jurisdiction
Patent Number
074681100
Date of Patent
December 23, 2008
0Patent Application Number
110910290
Date Filed
March 28, 2005
0Official Website
Patent Primary Examiner
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US Patent 07468110 Hollow cathode target and methods of making same
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07468110
Date of patent
December 23, 2008
Patent application number
11091029
Date Filed
March 28, 2005
Patent primary examiner
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