US Patent 7468326 Method of cleaning a wafer
Patent 7468326 was granted and assigned to United Microelectronics Corporation on December, 2008 by the United States Patent and Trademark Office.
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Patent abstract
A wafer is provided and loaded in a reaction chamber. Subsequently, the wafer is lifted up, and a dry clean process is performed on the wafer to clean the front side, the back side, and the bevel of the wafer. Following that, a deposition process is performed on the wafer. The dry clean process and the deposition process are carried out in an in-situ manner.
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Official Website
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US Patent 07468326 Method of cleaning a wafer US Patent 7468326 Method of cleaning a wafer
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Patent Number
0746832600
Patent Number
746832600
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Infobox
Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
074683260
Date of Patent
December 23, 2008
0Patent Application Number
111619610
Date Filed
August 24, 2005
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
074683260
Date of Patent
December 23, 2008
0Patent Application Number
111619610
Date Filed
August 24, 2005
0Official Website
Patent Primary Examiner
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US Patent 07468326 Method of cleaning a wafer
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07468326
Date of patent
December 23, 2008
Patent application number
11161961
Date Filed
August 24, 2005
Patent primary examiner
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