Patent attributes
According to one exemplary embodiment, a method for increasing manufacturability of a circuit layer includes determining a threshold value for at least one image property from a repetitive section of the circuit layout. According to this embodiment, the method further includes performing a simulated lithographic process using the circuit layout to determine a number of simulated values of the at least one image property for a non-repetitive section of the circuit layout. The method further includes comparing each of the simulated values with the threshold value to determine printability of the non-repetitive section of the circuit layout prior to lithographically printing the circuit layout on a wafer. The method further includes modifying the non-repetitive section of the circuit layout if the threshold value is greater than at least one of the simulated values. By modifying the non-repetitive section of the circuit layout, manufacturability of the circuit layout can be increased.
