Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yousuke Irie0
Kiyoyuki Morita0
Masaaki Suzuki0
Masahiko Hashimoto0
Akihisa Adachi0
Date of Patent
March 24, 2009
0Patent Application Number
105148110
Date Filed
May 12, 2003
0Patent Primary Examiner
Patent abstract
A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering substances adhering to at least the surface of the recess structure of the component that has the recess structure, cleaning is carried out by using the supercritical gas or the liquefied gas so that the cleaning medium spreads over the surface of the recess structure.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
