US Patent 7507297 Cleaning method and cleaning apparatus
Patent 7507297 was granted and assigned to Panasonic on March, 2009 by the United States Patent and Trademark Office.
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Patent Inventor Names
Akihisa Adachi0
Kiyoyuki Morita0
Masaaki Suzuki0
Masahiko Hashimoto0
Yousuke Irie0
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Patent abstract
A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering substances adhering to at least the surface of the recess structure of the component that has the recess structure, cleaning is carried out by using the supercritical gas or the liquefied gas so that the cleaning medium spreads over the surface of the recess structure.
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US Patent 07507297 Cleaning method and cleaning apparatus US Patent 7507297 Cleaning method and cleaning apparatus
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Patent Number
075072970
Patent Number
75072970
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
075072970
Date of Patent
March 24, 2009
0Patent Application Number
105148110
Date Filed
May 12, 2003
0Official Website
Patent Primary Examiner
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US Patent 07507297 Cleaning method and cleaning apparatus
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07507297
Date of patent
March 24, 2009
Patent application number
10514811
Date Filed
May 12, 2003
Patent primary examiner
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