US Patent 7526119 Pattern inspection apparatus

With a pattern inspection apparatus, image data corresponding to all patterns on an inspection target plate can be generated on the basis of scanned pattern data obtained with low-magnification optics different from ordinary inspection optics, or design pattern data. A pattern repeated area can be automatically detected from the image data. Therefore, die-to-die comparative inspection can be performed if the operator does not specify which dies to inspect. Thus, the inspection throughput can be improved.