Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Wouter Onno Pril0
Date of Patent
May 19, 2009
0Patent Application Number
108994370
Date Filed
July 27, 2004
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A lithographic apparatus is presented that includes a substrate holder configured to hold a substrate, an illuminator configured to condition a beam of radiation, a support structure configured to support a patterning device that imparts a desired pattern to the beam of radiation, a projection system that projects the patterned beam onto a target portion of the substrate, and an interferometer system configured to measure a position of the object to assist in positioning the object.
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