US Patent 7545041 Techniques for patterning features in semiconductor devices
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Patent Inventor Names
Arpan P. Mahorowala0
Dirk Pfeiffer0
Katherina E. Babich0
Richard Stephan Wise0
Scott D. Allen0
Steven J. Holmes0
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Patent abstract
Techniques for semiconductor processing are provided. In one aspect, a method for patterning one or more features in a semiconductor device comprises the following step. At least one critical dimension of the one or more features is reduced during etching of the antireflective material. A lithographic structure is also provided.
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US Patent 07545041 Techniques for patterning features in semiconductor devices US Patent 7545041 Techniques for patterning features in semiconductor devices
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Patent Number
07545041
Patent Number
7545041
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US Patent 07545041 Techniques for patterning features in semiconductor devices
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Patent jurisdiction
Patent number
07545041
Date of patent
June 9, 2009
Patent application number
11337411
Date Filed
January 23, 2006
Patent primary examiner
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