Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 4, 2009
Patent Application Number
11492957
Date Filed
July 26, 2006
Patent Primary Examiner
Patent abstract
A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.
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