US Patent 7569323 Resist protective coating material and patterning process
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Patent abstract
A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.
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US Patent 07569323 Resist protective coating material and patterning process US Patent 7569323 Resist protective coating material and patterning process
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Patent Number
0756932300
Patent Number
756932300
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Infobox
Is a
Patent Jurisdiction
Patent Number
075693230
Date of Patent
August 4, 2009
0Patent Application Number
114929570
Date Filed
July 26, 2006
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
075693230
Date of Patent
August 4, 2009
0Patent Application Number
114929570
Date Filed
July 26, 2006
0Official Website
Patent Primary Examiner
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US Patent 07569323 Resist protective coating material and patterning process
Infobox
Is a
Patent jurisdiction
Patent number
07569323
Date of patent
August 4, 2009
Patent application number
11492957
Date Filed
July 26, 2006
Patent primary examiner
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