Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 4, 2009
0Patent Application Number
115921420
Date Filed
November 3, 2006
0Patent Primary Examiner
Patent abstract
A lithography method has a simulation method for mathematically approximating a photoresist film pattern with a Diffused Aerial Image Model (“DAIM”) for semiconductor device fabrication. The DAIM is applied with at least two acids having heterogeneous diffusion characteristics.
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