Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Takeshi Iwai0
Masaru Takeshita0
Ryotaro Hayashi0
Tadayuki Fujiwara0
Akifumi Ueda0
Atsushi Ootake0
Hikaru Momose0
Date of Patent
August 18, 2009
0Patent Application Number
105439140
Date Filed
January 29, 2004
0Patent Primary Examiner
Patent abstract
The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.
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