US Patent 7575846 Resist polymer and resist composition

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Edits on 17 Sep, 2023

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Patent Inventor Names

Akifumi Ueda0

Atsushi Ootake0

Hikaru Momose0

Masaru Takeshita0

Ryotaro Hayashi0

Tadayuki Fujiwara0

Takeshi Iwai0

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Patent abstract

The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=075758460

Edits on 20 May, 2023

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