US Patent 7584761 Wafer edge surface treatment with liquid meniscus
Patent 7584761 was granted and assigned to Lam Research on September, 2009 by the United States Patent and Trademark Office.
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A method for cleaning an edge surface of a semiconductor substrate is disclosed. The proximity head unit is positioned so that the flow head portion and the collection head portion of the proximity head unit are proximate to the edge surface of the semiconductor substrate. The semiconductor substrate is then rotated using one or more powered rollers. During the rotation of the semiconductor substrate, the flow head portion applies a fluid to the edge surface while the collection head portion collects fluid from the edge surface. Additional methods, an apparatuses, and a system for cleaning an edge surface of a semiconductor substrate are also described.
US Patent 07584761 Wafer edge surface treatment with liquid meniscus US Patent 7584761 Wafer edge surface treatment with liquid meniscus
US Patent 07584761 Wafer edge surface treatment with liquid meniscus
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