US Patent 7598015 Polymer, resist composition and patterning process
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Seiichiro Tachibana0
Takeru Watanabe0
Tsunehiro Nishi0
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Patent abstract
A (meth)acrylic copolymer is endowed with a good profile of rigidity and hydrophilicity by introducing not only polycyclic structure units, but also recurring units having a high polarity. A chemically amplified positive resist composition comprising the polymer has a high sensitivity, resolution and etch resistance and improved substrate adhesion and developer affinity.
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US Patent 07598015 Polymer, resist composition and patterning process US Patent 7598015 Polymer, resist composition and patterning process
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Patent Number
07598015
Patent Number
7598015
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US Patent 07598015 Polymer, resist composition and patterning process
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Patent jurisdiction
Patent number
07598015
Date of patent
October 6, 2009
Patent application number
11155605
Date Filed
June 20, 2005
Patent primary examiner
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