Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Sang-jun Choi0
Han-ku Cho0
Date of Patent
October 20, 2009
0Patent Application Number
116559770
Date Filed
January 22, 2007
0Patent Primary Examiner
Patent abstract
A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below:
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