US Patent 7604918 Photosensitive polymer and photoresist composition having the same
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Patent Inventor Names
Han-ku Cho0
Sang-jun Choi0
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Patent abstract
A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below:
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US Patent 07604918 Photosensitive polymer and photoresist composition having the same US Patent 7604918 Photosensitive polymer and photoresist composition having the same
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Patent Number
076049180
Patent Number
76049180
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Patent Jurisdiction
Patent Number
076049180
Date of Patent
October 20, 2009
0Patent Application Number
116559770
Date Filed
January 22, 2007
0Official Website
Patent Primary Examiner
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US Patent 07604918 Photosensitive polymer and photoresist composition having the same
Infobox
Is a
Patent jurisdiction
Patent number
07604918
Date of patent
October 20, 2009
Patent application number
11655977
Date Filed
January 22, 2007
Patent primary examiner
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