US Patent 7608521 Producing SOI structure using high-purity ion shower
Patent 7608521 was granted and assigned to Corning Incorporated on October, 2009 by the United States Patent and Trademark Office.
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Patent Inventor Names
Jeffrey Scott Cites0
Kishor Purushottam Gadkaree0
Richard Orr Maschmeyer0
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Patent abstract
Disclosed are methods for making SOI and SOG structures using purified ion shower for implanting ions to the donor substrate. The purified ion shower provides expedient, efficient, low-cost and effective ion implantation while minimizing damage to the exfoliation film.
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US Patent 07608521 Producing SOI structure using high-purity ion shower US Patent 7608521 Producing SOI structure using high-purity ion shower
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Patent Number
076085210
Patent Number
76085210
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Is a
Current Assignee
0
Patent Jurisdiction
Patent Number
076085210
Date of Patent
October 27, 2009
0Patent Application Number
114447410
Date Filed
May 31, 2006
0Official Website
Patent Primary Examiner
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US Patent 07608521 Producing SOI structure using high-purity ion shower
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07608521
Date of patent
October 27, 2009
Patent application number
11444741
Date Filed
May 31, 2006
Patent primary examiner
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