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US Patent 7611751 Vapor deposition of metal carbide films

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
November 1, 2006
Date of Patent
November 3, 2009
Patent Application Number
11591845
Patent Citations Received
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US Patent 12027367 Substrate treatment apparatus and manufacturing method of semiconductor device
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US Patent 11804373 Selective layer formation using deposition and removing
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US Patent 11830732 Selective passivation and selective deposition
0
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US Patent 11835481 Physical vapor deposited biosensor components
0
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US Patent 11881549 Physical vapor deposited electrode for electrochemical sensors
0
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US Patent 11776807 Plasma enhanced deposition processes for controlled formation of oxygen containing thin films
Patent Inventor Names
Kai-Erik Elers
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
7611751
Patent Primary Examiner
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Roberts Culbert

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