US Patent 7611985 Formation of holes in substrates using dewetting coatings

Patent 7611985 was granted and assigned to Intel on November, 2009 by the United States Patent and Trademark Office.

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Patent Number

Date of Patent

November 3, 2009

Patent Application Number

11533653

Date Filed

September 20, 2006

Patent Primary Examiner

Patent abstract

Methods and systems for forming holes in a substrate using dewetting coating are described herein.

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