US Patent 7611985 Formation of holes in substrates using dewetting coatings
Patent 7611985 was granted and assigned to Intel on November, 2009 by the United States Patent and Trademark Office.
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Patent abstract
Methods and systems for forming holes in a substrate using dewetting coating are described herein.
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US Patent 07611985 Formation of holes in substrates using dewetting coatings US Patent 7611985 Formation of holes in substrates using dewetting coatings
Infobox
Patent Number
0761198500
Patent Number
761198500
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076119850
Date of Patent
November 3, 2009
0Patent Application Number
115336530
Date Filed
September 20, 2006
0Official Website
Patent Primary Examiner
Edits on 26 Sep, 2022
Golden AI
Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076119850
Date of Patent
November 3, 2009
0Patent Application Number
115336530
Date Filed
September 20, 2006
0Official Website
Patent Primary Examiner
Edits on 18 Jun, 2022
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US Patent 07611985 Formation of holes in substrates using dewetting coatings
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07611985
Date of patent
November 3, 2009
Patent application number
11533653
Date Filed
September 20, 2006
Patent primary examiner
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