Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Tsunehiro Nishi0
Katsuhiro Kobayashi0
Seiichiro Tachibana0
Date of Patent
November 17, 2009
Patent Application Number
12003834
Date Filed
January 2, 2008
Patent Primary Examiner
Patent abstract
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator which is a specific sulfonium salt compound. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.12,5.17,10]dodecane structure, di- or trihydroxyadamantyl units, and monocyclic lactone units.
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