US Patent 7618765 Positive resist composition and patterning process
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Katsuhiro Kobayashi0
Seiichiro Tachibana0
Tsunehiro Nishi0
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Patent abstract
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid, and (B) an acid generator which is a specific sulfonium salt compound. The resin (A) is a polymer comprising tertiary alkyl protective group units having a hydrophobic tetracyclo[4.4.0.12,5.17,10]dodecane structure, di- or trihydroxyadamantyl units, and monocyclic lactone units.
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US Patent 07618765 Positive resist composition and patterning process US Patent 7618765 Positive resist composition and patterning process
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Patent Number
07618765
Patent Number
7618765
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US Patent 07618765 Positive resist composition and patterning process
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Is a
Patent jurisdiction
Patent number
07618765
Date of patent
November 17, 2009
Patent application number
12003834
Date Filed
January 2, 2008
Patent primary examiner
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