Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 1, 2009
Patent Application Number
11297641
Date Filed
December 9, 2005
Patent Citations Received
Patent Primary Examiner
Patent abstract
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.
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