US Patent 7626181 Lithographic apparatus and device manufacturing method
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Patent abstract
Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.
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US Patent 07626181 Lithographic apparatus and device manufacturing method US Patent 7626181 Lithographic apparatus and device manufacturing method
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Patent Number
0762618100
Patent Number
762618100
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Patent Jurisdiction
Patent Number
076261810
Date of Patent
December 1, 2009
0Patent Application Number
112976410
Date Filed
December 9, 2005
0Official Website
Patent Primary Examiner
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Patent Jurisdiction
Patent Number
076261810
Date of Patent
December 1, 2009
0Patent Application Number
112976410
Date Filed
December 9, 2005
0Official Website
Patent Primary Examiner
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US Patent 07626181 Lithographic apparatus and device manufacturing method
Infobox
Is a
Patent jurisdiction
Patent number
07626181
Date of patent
December 1, 2009
Patent application number
11297641
Date Filed
December 9, 2005
Patent primary examiner
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