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US Patent 7633303 Semiconductor wafer inspection apparatus

Patent 7633303 was granted and assigned to Hitachi on December, 2009 by the United States Patent and Trademark Office.

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Patent Inventor Names
Natsuki Tsuno0
Takashi Furukawa0
Zhaohui Cheng0
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Patent abstract

Efficiency of a charging processing of an insulator sample is improved. And, an electron optical system is adjusted according to a contact resistance value of the insulator sample. Breakdown of a sample is performed before the charging processing, and then, the charging processing is performed. A control parameter of the electron optical system is selected using a result of a resistance value of the sample for checking the breakdown.

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US Patent 07633303 Semiconductor wafer inspection apparatus US Patent 7633303 Semiconductor wafer inspection apparatus

Infobox
Patent Number
076333030
Patent Number
76333030
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=076333030
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Infobox
Is a
Patent
Patent
0
Current Assignee
Hitachi
Hitachi
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
076333030
Date of Patent
December 15, 2009
0
Patent Application Number
120629400
Date Filed
April 4, 2008
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=076333030
Patent Primary Examiner
‌
Jermele M Hollington
0
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"Entity importer update"
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edited on 18 Jun, 2022
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=07633303
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created this topic on 3 Dec, 2021
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 US Patent 07633303 Semiconductor wafer inspection apparatus

Infobox
Is a
Patent
Patent
Current assignee
Hitachi
Hitachi
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
07633303
Date of patent
December 15, 2009
Patent application number
12062940
Date Filed
April 4, 2008
Patent primary examiner
‌
Jermele M Hollington

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