Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
February 16, 2010
Patent Application Number
10552731
Date Filed
April 9, 2004
Patent Primary Examiner
Patent abstract
In a pattern writing method for writing a pattern on a substrate by the use of projection patterns output from a mirror device including two-dimensionally arranged micromirrors, exposure is implemented by ON/OFF controlling each micromirror and partly overlapping the projection patterns from the mirror device at least in a one-dimensional direction, thereby accurately controlling the exposure of intermediate amounts of light.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
