US Patent 7663734 Pattern writing system and pattern writing method
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Patent abstract
In a pattern writing method for writing a pattern on a substrate by the use of projection patterns output from a mirror device including two-dimensionally arranged micromirrors, exposure is implemented by ON/OFF controlling each micromirror and partly overlapping the projection patterns from the mirror device at least in a one-dimensional direction, thereby accurately controlling the exposure of intermediate amounts of light.
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US Patent 07663734 Pattern writing system and pattern writing method US Patent 7663734 Pattern writing system and pattern writing method
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Patent Number
0766373400
Patent Number
766373400
Edits on 2 Apr, 2023
Golden AI
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Patent Jurisdiction
Patent Number
076637340
Date of Patent
February 16, 2010
0Patent Application Number
105527310
Date Filed
April 9, 2004
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
076637340
Date of Patent
February 16, 2010
0Patent Application Number
105527310
Date Filed
April 9, 2004
0Official Website
Patent Primary Examiner
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US Patent 07663734 Pattern writing system and pattern writing method
Infobox
Is a
Patent jurisdiction
Patent number
07663734
Date of patent
February 16, 2010
Patent application number
10552731
Date Filed
April 9, 2004
Patent primary examiner
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