Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
April 6, 2010
Patent Application Number
12064721
Date Filed
August 30, 2006
Patent Primary Examiner
Patent abstract
In a process chamber of a substrate processing apparatus, such as an RTP apparatus, a carrier is placed and configured to carry out a contaminant that has been attached to it. In this state, a cleaning gas containing N2 and O2 is introduced into the process chamber, and cleaning is performed under conditions including a pressure of 133.3 Pa or less and a temperature of 700° C. to 1,100° C. This cleaning is repeatedly performed by sequentially replacing a plurality of carriers.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
