US Patent 7691208 Cleaning method
Patent 7691208 was granted and assigned to Tokyo Electron on April, 2010 by the United States Patent and Trademark Office.
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Patent abstract
In a process chamber of a substrate processing apparatus, such as an RTP apparatus, a carrier is placed and configured to carry out a contaminant that has been attached to it. In this state, a cleaning gas containing N2 and O2 is introduced into the process chamber, and cleaning is performed under conditions including a pressure of 133.3 Pa or less and a temperature of 700° C. to 1,100° C. This cleaning is repeatedly performed by sequentially replacing a plurality of carriers.
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US Patent 07691208 Cleaning method US Patent 7691208 Cleaning method
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Patent Number
0769120800
Patent Number
769120800
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
076912080
Date of Patent
April 6, 2010
0Patent Application Number
120647210
Date Filed
August 30, 2006
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
076912080
Date of Patent
April 6, 2010
0Patent Application Number
120647210
Date Filed
August 30, 2006
0Official Website
Patent Primary Examiner
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US Patent 07691208 Cleaning method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07691208
Date of patent
April 6, 2010
Patent application number
12064721
Date Filed
August 30, 2006
Patent primary examiner
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