US Patent 7695892 Resist composition and pattern-forming method using same
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Patent abstract
A resist composition comprises (A) at least two kinds of resins each of which decomposes by the action of an acid to undergo an increase in its solubility for an alkali developer, wherein at least one kind of the resins (A) is a resin synthesized by living radical polymerization using a chain transfer agent represented by formula (I):
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Patent Inventor Names
Sou Kamimura0
Yushi Kaneko0
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US Patent 07695892 Resist composition and pattern-forming method using same US Patent 7695892 Resist composition and pattern-forming method using same
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Patent Number
07695892
Patent Number
7695892
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US Patent 07695892 Resist composition and pattern-forming method using same
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Patent jurisdiction
Patent number
07695892
Date of patent
April 13, 2010
Patent application number
12053927
Date Filed
March 24, 2008
Patent primary examiner
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