US Patent 7700256 Phenolic/alicyclic copolymers and photoresists
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Patent abstract
The present invention relates to new polymers that contain repeat units of phenol and photoacid-labile esters that contain an alicyclic group, preferably a bulky group that suitably may contain 7 to about 20 carbons, such as an alkyladamantyl, ethylfencyl, tricyclo decanyl, or pinanyl group. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
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Patent Inventor Names
Anthony Zampini0
Ashish Pandya0
Gary Ganghui Teng0
George G. Barclay0
Wang Yueh0
Zhibiao Mao0
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US Patent 07700256 Phenolic/alicyclic copolymers and photoresists US Patent 7700256 Phenolic/alicyclic copolymers and photoresists
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Patent Number
077002560
Patent Number
77002560
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Official Website
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Patent Jurisdiction
Patent Number
077002560
Date of Patent
April 20, 2010
0Patent Application Number
103139540
Date Filed
December 6, 2002
0Official Website
Patent Primary Examiner
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US Patent 07700256 Phenolic/alicyclic copolymers and photoresists
Infobox
Is a
Patent jurisdiction
Patent number
07700256
Date of patent
April 20, 2010
Patent application number
10313954
Date Filed
December 6, 2002
Patent primary examiner
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