Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Carmen S. Menoni0
Przemyslaw W. Wachulak0
Mario C. Marconi0
Jorge J. Rocca0
Date of Patent
April 27, 2010
0Patent Application Number
118408900
Date Filed
August 17, 2007
0Patent Primary Examiner
Patent abstract
Direct patterning of nanometer scale features by interferometric lithography using a 46.9 nm laser is described. Multiple exposures using a Lloyd's mirror interferometer permitted printing of arrays having 60 nm FWHM features.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
