US Patent 7705332 Nanometer-scale lithography using extreme ultraviolet/soft x-ray laser interferometry
All edits
Edits on 30 Oct, 2023
Golden AI
Edits made to:
Article (+241 characters)
Article
Patent abstract
Direct patterning of nanometer scale features by interferometric lithography using a 46.9 nm laser is described. Multiple exposures using a Lloyd's mirror interferometer permitted printing of arrays having 60 nm FWHM features.
Edits on 18 Sep, 2023
Golden AI
Edits made to:
Infobox (+4 properties)
Infobox
Patent Inventor Names
Carmen S. Menoni0
Jorge J. Rocca0
Mario C. Marconi0
Przemyslaw W. Wachulak0
Edits on 13 Jul, 2023
Golden AI
Edits made to:
Infobox (+1/-1 properties)
US Patent 07705332 Nanometer-scale lithography using extreme ultraviolet/soft x-ray laser interferometry US Patent 7705332 Nanometer-scale lithography using extreme ultraviolet/soft x-ray laser interferometry
Infobox
Patent Number
077053320
Patent Number
77053320
Edits on 25 May, 2023
Golden AI
Edits made to:
Infobox (-1 properties)
Infobox
Official Website
Edits on 23 Apr, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
077053320
Date of Patent
April 27, 2010
0Patent Application Number
118408900
Date Filed
August 17, 2007
0Official Website
Patent Primary Examiner
Edits on 18 Jun, 2022
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Website URL
Edits on 4 Dec, 2021
Golden AI
Edits made to:
Infobox (+7 properties)
US Patent 07705332 Nanometer-scale lithography using extreme ultraviolet/soft x-ray laser interferometry
Infobox
Is a
Patent jurisdiction
Patent number
07705332
Date of patent
April 27, 2010
Patent application number
11840890
Date Filed
August 17, 2007
Patent primary examiner
Find more entities like US Patent 7705332 Nanometer-scale lithography using extreme ultraviolet/soft x-ray laser interferometry
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
