Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masaru Sasago0
Masayuki Endo0
Date of Patent
May 11, 2010
Patent Application Number
11143666
Date Filed
June 3, 2005
Patent Primary Examiner
Patent abstract
An exposure system includes a cleaning unit for cleaning a surface of a resist film formed on a wafer with a cleaning fluid and an exposure unit for performing pattern exposure with an immersion liquid provided between the resist film and a projection lens.
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