US Patent 7713685 Exposure system and pattern formation method
Patent 7713685 was granted and assigned to Panasonic on May, 2010 by the United States Patent and Trademark Office.
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Patent abstract
An exposure system includes a cleaning unit for cleaning a surface of a resist film formed on a wafer with a cleaning fluid and an exposure unit for performing pattern exposure with an immersion liquid provided between the resist film and a projection lens.
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Patent Inventor Names
Masaru Sasago0
Masayuki Endo0
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US Patent 07713685 Exposure system and pattern formation method US Patent 7713685 Exposure system and pattern formation method
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Patent Number
07713685
Patent Number
7713685
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Official Website
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US Patent 07713685 Exposure system and pattern formation method
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Is a
Current assignee
Patent jurisdiction
Patent number
07713685
Date of patent
May 11, 2010
Patent application number
11143666
Date Filed
June 3, 2005
Patent primary examiner
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