Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Matthew E. Colburn0
Dario L. Goldfarb0
Date of Patent
June 1, 2010
0Patent Application Number
121215020
Date Filed
May 15, 2008
0Patent Primary Examiner
Patent abstract
A method for fabricating a dual damascene structure includes providing a multi-layer photoresist stack comprising a first photoresist layer and a second photoresist layer, wherein each photoresist layer has a distinct dose-to-clear value, exposing said photoresist stack to one or more predetermined patterns of light, and developing said photo-resist layers to form a multi-tiered structure in the photo-resist layers.
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