US Patent 7727708 Method for fabricating dual damascene structures
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Patent abstract
A method for fabricating a dual damascene structure includes providing a multi-layer photoresist stack comprising a first photoresist layer and a second photoresist layer, wherein each photoresist layer has a distinct dose-to-clear value, exposing said photoresist stack to one or more predetermined patterns of light, and developing said photo-resist layers to form a multi-tiered structure in the photo-resist layers.
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Patent Inventor Names
Dario L. Goldfarb0
Matthew E. Colburn0
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US Patent 07727708 Method for fabricating dual damascene structures US Patent 7727708 Method for fabricating dual damascene structures
Infobox
Patent Number
077277080
Patent Number
77277080
Edits on 24 Sep, 2022
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Patent Jurisdiction
Patent Number
077277080
Date of Patent
June 1, 2010
0Patent Application Number
121215020
Date Filed
May 15, 2008
0Official Website
Patent Primary Examiner
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US Patent 07727708 Method for fabricating dual damascene structures
Infobox
Is a
Patent jurisdiction
Patent number
07727708
Date of patent
June 1, 2010
Patent application number
12121502
Date Filed
May 15, 2008
Patent primary examiner
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