Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
June 8, 2010
Patent Application Number
10995653
Date Filed
November 23, 2004
Patent Primary Examiner
Patent abstract
A method comprises forming a photoresist on a substrate, rinsing the photoresist using a rinse liquid agitated with at least one megasonic source, exposing the photoresist to radiation while immersed in a liquid, and developing the photoresist.
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